Open Access   Article Go Back

Leakage Reduction Technique on FinFET Based 7T and 8T SRAM Cells

Anugrah Narayan Singh1 , Ravi Koneti2

Section:Research Paper, Product Type: Journal Paper
Volume-3 , Issue-5 , Page no. 148-157, May-2015

Online published on May 30, 2015

Copyright © Anugrah Narayan Singh , Ravi Koneti . This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

View this paper at   Google Scholar | DPI Digital Library

How to Cite this Paper

  • IEEE Citation
  • MLA Citation
  • APA Citation
  • BibTex Citation
  • RIS Citation

IEEE Style Citation: Anugrah Narayan Singh , Ravi Koneti, “Leakage Reduction Technique on FinFET Based 7T and 8T SRAM Cells,” International Journal of Computer Sciences and Engineering, Vol.3, Issue.5, pp.148-157, 2015.

MLA Style Citation: Anugrah Narayan Singh , Ravi Koneti "Leakage Reduction Technique on FinFET Based 7T and 8T SRAM Cells." International Journal of Computer Sciences and Engineering 3.5 (2015): 148-157.

APA Style Citation: Anugrah Narayan Singh , Ravi Koneti, (2015). Leakage Reduction Technique on FinFET Based 7T and 8T SRAM Cells. International Journal of Computer Sciences and Engineering, 3(5), 148-157.

BibTex Style Citation:
@article{Singh_2015,
author = {Anugrah Narayan Singh , Ravi Koneti},
title = {Leakage Reduction Technique on FinFET Based 7T and 8T SRAM Cells},
journal = {International Journal of Computer Sciences and Engineering},
issue_date = {5 2015},
volume = {3},
Issue = {5},
month = {5},
year = {2015},
issn = {2347-2693},
pages = {148-157},
url = {https://www.ijcseonline.org/full_paper_view.php?paper_id=496},
publisher = {IJCSE, Indore, INDIA},
}

RIS Style Citation:
TY - JOUR
UR - https://www.ijcseonline.org/full_paper_view.php?paper_id=496
TI - Leakage Reduction Technique on FinFET Based 7T and 8T SRAM Cells
T2 - International Journal of Computer Sciences and Engineering
AU - Anugrah Narayan Singh , Ravi Koneti
PY - 2015
DA - 2015/05/30
PB - IJCSE, Indore, INDIA
SP - 148-157
IS - 5
VL - 3
SN - 2347-2693
ER -

VIEWS PDF XML
2387 2347 downloads 2574 downloads
  
  
           

Abstract

In this paper, we propose a FinFET based 7T and 8T Static Random Access Memory (SRAM) cells. FinFETs also promise to improve challenging performance versus power tradeoffs. Designers can run the transistors more rapidly and use the similar amount of power, compared to the planar CMOS, or run them at the similar performance using less power. The aim of this paper is to reduce the leakage current and leakage power of FinFET based SRAM cells using Self-controllable Voltage Level (SVL) circuit Techniques in 45nm Technology. SVL circuit allows supply voltage for a maximum DC voltage to be applied on active load or can reduce the supplied DC voltage to a load in standby mode. This SVL circuit can reduce standby leakage power of SRAM cell with minimum problem in terms of chip area and speed. High leakage currents in submicron regimes are primary contributors to total power dissipation of bulk CMOS circuits as the threshold voltage, channel length and gate oxide thickness are scaled down. The leakage current in the SRAM cell increases due to reduction in channel length of the MOSFET. Two methods are used; one method in which the supply voltage is reduced and other method in which the ground potential is increased. The Proposed FinFET based 7T and 8T SRAM cells have been designed using Cadence Virtuoso Tool, all the simulation results has been generated by Cadence SPECTRE simulator at 45nm Technology.

Key-Words / Index Term

FinFET; Leakage Current; Leakage Power; Static random access memory (SRAM); Self-controllable Voltage Level (SVL); Upper SVL; Lower SVL

References

[1] K. Bowman, et al., “Impact of die-to-die and within die parameter fluctuations on the maximum clock frequency distribution for gigascale integration,” IEEE J. Solid-State Circuits, vol. 37, no. 2, 2002, pp. 183-190.
[2] S. Borkar, et al., “Parameter variations and impact on circuits and microarchitecture,” ACWIEEE DAC, 2003, pp. 338-342.
[3] T. Karnik, T. De, and S. Borkar, “Statistical design for variation tolerance: key to continued Moore’s law,” in Proc. Int. Conf. Integrated Circuit Design and Technology, 2004, pp. 175-176.
[4] Yu, H. Wang, A. Joshi, Q. Xiang, E. Ibok, and M. R. Lin, “15 nm gate length planar CMOS transistor,” in IEDM Tech. Dig., 2001, pp. 937–939.
[5] Hisamoto, W. C. Lee, J. Kedzierski, H. Takeuchi, K. Asano, C. Kuo, E. Anderson, T. J. King, J. Bokor, and C. Hu, “FinFET—A self-aligned double-gate MOSFET scalable to 20 nm,” IEEE Trans. Electron Devices, vol. 47, 2000, pp. 2320–2325.
[6] J. Y. S. Balasubramanium, “Design of sub-50 nm FinFET based low power SRAMs,” Semicond. Sci. Technol., vol. 23, 2008, p. 13-19.
[7] K. Zhang, U. Bhattacharya, Z. Chen, F. Hamzaoglu, D. Murray, N. Vallepalli, Y. Wang, B. Zheng, and M. Bohr, “A 3-GHz 70 MB SRAM in 65nm CMOS technology with integrated column-based dynamic power supply,” in Proc. IEEE Int. Solid-State Circuits Conf., 2005, pp. 474–476.
[8] M.D. Powell, S.H. Yang, B. Falsafi et. al, “Gated – VDD:A circuit technique to reduce leakage in cache memories,” in proceedings of International Symposium on Low Power Electronics and Design, 2000, pp. 90-95.
[9] Amit Agarwal, Hai Li and Kaushik Roy, “DRG Cache: A data retention gated- ground cache for low power,” in proceedings of the 39th Design Automation Conference, 2002, pp. 473-478.
[10] Rafik S. Guindi , Farid N. Najm, “Design Techniques for Gate-Leakage Reduction in CMOS Circuits,” in proceedings of the Fourth International Symposium on Quality Electronic Design, 2003, pp. 61-65.
[11] L. Chang et al., “Stable SRAM Cell Design for the 32nm Node and Beyond,” Symp. VLSI Tech. Dig., 2005, pp. 292-293.
[12] Enomoto, T., Oka, Y., Shikano, H., & Harada, T., “A self-controllable voltage-level (SVL) circuit for low-power, high-speed CMOS circuits,” in Proceedings of European solid-state circuits conference, 2002, pp. 411–414.
[13] K. Kanda, H. Sadaaki, and T. Sakurai, “90% write power-saving SRAM using sense-amplifying memory cell,” IEEE Journal of Solid-State Circuits, vol. 39, 2004, pp. 927–933.
[14] S. Lavanya, and J. Lisbin, “Self controllable voltage level (SVL) for low power consumption” in IEEE International Conference on Computational Intelligence & Computing Research (ICCIC), 2012, pp. 1-5.